High-flow capability, typically optimized for 1 to 3 slm (standard liters per minute) of process gas.
: Features a compact aluminum plasma channel and is often integrated with Applied Materials (AMAT) or Novellus systems. The University of Arizona Maintenance and Safety
MKS ASTeX ASTRON 2L is a high-performance Remote Plasma Source (RPS) primarily used in semiconductor manufacturing for chemical vapor deposition (CVD) chamber cleaning and thin-film processing. This system is designed as a self-contained, "lid-mount" unit that generates reactive gas radicals—like atomic fluorine from cap N cap F sub 3
—often identified by part numbers like AX7657-85 or AX7657-7 —is a high-performance . It is widely used in semiconductor manufacturing to clean process chambers during deposition and etching operations. mks astron 2l manual
I notice you're asking me to "make paper" for the .
According to MKS application notes and manual best practices, physical positioning directly dictates the lifespan and performance of your radical transport pipeline.
Operating the MKS Astron 2L is straightforward, but following the proper sequence ensures long-term reliability. Initial Startup Procedure High-flow capability, typically optimized for 1 to 3
If the unit fails to ignite, check the cooling water flow and temperature interlocks first. The system will automatically shut down if flow drops below the safety threshold. Finding the Full Manual
Ensure downstream piping can withstand active fluorine radicals. Use appropriate materials like specialized stainless steel or aluminum alloys. 3. Installation and Utility Hookups
: Minimum 2.0 gpm during operation; 0.5 gpm during idle. Temperature : Maximum inlet temperature of Gas Connections : Uses ISO KF40 connections for both inlet and outlet. This system is designed as a self-contained, "lid-mount"
The is more than a technical guide; it is a blueprint for high-efficiency semiconductor manufacturing and environmental stewardship. The Astron 2L is a Remote Plasma Source (RPS) —a self-contained reactive gas generator that uses patented low-field toroidal plasma technology to dissociate gases like Nitrogen Trifluoride ( NF3cap N cap F sub 3 ) into highly reactive atomic fluorine. The Philosophy of "Remote" Plasma
Mount the Astron 2L as close to the process chamber as possible to minimize radical recombination along the delivery tube.
The high voltage output (pin 3) is lethal. Always disconnect power before handling the cable.